Feeds

Intel 45nm CPUs to use metal gates, high-k dielectric

One step ahead of the competition

Internet Security Threat Report 2014

Intel's 45nm microprocessors will incorporate transistors constructed with metal gates and high-k dielectric materials, the chip maker revealed today. That said, it was tight-lipped about which materials will actually make up these components in its 45nm dual-core die, 'Penryn'.

Penryn's transistors use a metal in place of the polysilicon material that controls the flow of current through today's transistors. And where standard processor transistors separate the gate from the source and drain, and the silicon substrate all these elements are mounted on, Penryn's transistors will use a high-k oxide.

intel's 45nm metal-gate, high-k transistor

The upshot, Intel claimed, was a "significant performance increase and leakage reduction" - less power is required to switch the flow of electrons through the transistor on and off. Leakage - the flow of current outside the transistor - is reduced, Intel said, because the use of a high-k material means the oxide layer can be thicker than is currently the case, making it harder for electrons to leak through. The high-k material is derived from Hafnium, but Intel would say no more.

It said the new transistor construction will see source-drain leakage reduced fivefold and gate oxide leakage tenfold. Or Intel can opt to raise the drive current 20 per cent, boosting the transistor's switch speed, which essentially means faster processing. Those figures are relative to a standard transistor rather than the design implemented in Intel's 65nm transistors, which included a low-k gate oxide.

Intel also claimed the metal gate and high-k combo would yield around a 30 per cent reduction in the power needed to switch the transistor.

Intel has been working on high-k dielectrics since 2003 at the very least, though it's a technique arch-rival AMD has in the past poo-poo'd. It has put its faith in silicon-on-insulator (SOI) technology and a three-gate transistor design.

Top 5 reasons to deploy VMware with Tegile

More from The Register

next story
Docker's app containers are coming to Windows Server, says Microsoft
MS chases app deployment speeds already enjoyed by Linux devs
Intel, Cisco and co reveal PLANS to keep tabs on WORLD'S MACHINES
Connecting everything to everything... Er, good idea?
SDI wars: WTF is software defined infrastructure?
This time we play for ALL the marbles
'Urika': Cray unveils new 1,500-core big data crunching monster
6TB of DRAM, 38TB of SSD flash and 120TB of disk storage
Facebook slurps 'paste sites' for STOLEN passwords, sprinkles on hash and salt
Zuck's ad empire DOESN'T see details in plain text. Phew!
Windows 10: Forget Cloudobile, put Security and Privacy First
But - dammit - It would be insane to say 'don't collect, because NSA'
Oracle hires former SAP exec for cloudy push
'We know Larry said cloud was gibberish, and insane, and idiotic, but...'
prev story

Whitepapers

Forging a new future with identity relationship management
Learn about ForgeRock's next generation IRM platform and how it is designed to empower CEOS's and enterprises to engage with consumers.
Win a year’s supply of chocolate
There is no techie angle to this competition so we're not going to pretend there is, but everyone loves chocolate so who cares.
Why cloud backup?
Combining the latest advancements in disk-based backup with secure, integrated, cloud technologies offer organizations fast and assured recovery of their critical enterprise data.
High Performance for All
While HPC is not new, it has traditionally been seen as a specialist area – is it now geared up to meet more mainstream requirements?
Saudi Petroleum chooses Tegile storage solution
A storage solution that addresses company growth and performance for business-critical applications of caseware archive and search along with other key operational systems.