Feeds

Intel pumps $20m into EUV optics researcher

Paving way for 32nm node

  • alert
  • submit to reddit

Intel has entered into a three-year, $20 million deal with lithography optics specialist Cymer to fund the development of extreme UV (EUV) light sources.

Intel believes EUV lithography will play a key role in the construction of 32nm transistors and processors, which it expects to put into production in 2009.

But as fabrication processes shrink, the equipment needed to make chip construction not only possible but financially viable becomes more complex and expensive. Building suitable light sources is only one part of the process.

"Accelerating EUV technology development to enable its successful implementation in high volume manufacturing for the 32nm node in 2009 is a critical mission at Intel," said Peter Silverman, Intel Fellow and director of Intel's Lithography Capital Equipment Development, in a statement.

"This agreement will further enable Intel and Cymer to concentrate on the critical technology challenges and on delivering a cost-effective, commercial EUV source solution to produce development tools in 2006 and meet the industry's 2009 production timeline." ®

Whitepapers

Forging a new future with identity relationship management
Learn about ForgeRock's next generation IRM platform and how it is designed to empower CEOS's and enterprises to engage with consumers.
Cloud and hybrid-cloud data protection for VMware
Learn how quick and easy it is to configure backups and perform restores for VMware environments.
Three 1TB solid state scorchers up for grabs
Big SSDs can be expensive but think big and think free because you could be the lucky winner of one of three 1TB Samsung SSD 840 EVO drives that we’re giving away worth over £300 apiece.
Reg Reader Research: SaaS based Email and Office Productivity Tools
Read this Reg reader report which provides advice and guidance for SMBs towards the use of SaaS based email and Office productivity tools.
Security for virtualized datacentres
Legacy security solutions are inefficient due to the architectural differences between physical and virtual environments.